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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications John E.J. Schmitz (Philips Semiconductor former COO of SEMATECH)

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications By John E.J. Schmitz (Philips Semiconductor former COO of SEMATECH)

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications by John E.J. Schmitz (Philips Semiconductor former COO of SEMATECH)


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Summary

Supplies the reader with the background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. This book describes materials deposition chemistry, equipment, process technology, developments, and applications.

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications Summary

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications by John E.J. Schmitz (Philips Semiconductor former COO of SEMATECH)

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications Reviews

"After reading this book, an engineer should have all the necessary background." --European Semiconductor

Table of Contents

Introduction The Blanket Tungsten Approach The Selective Tungsten Approach Blanket Versus Selective Tungsten Tungsten as Interconnect Material The Chemistry of CVD-W and Properties of Tungsten The Deposition Equipment Miscellaneous Chemical Vapor Deposition of Tungsten Silicide References Author Index Subject Index Appendix: Unit Cells of W and WSi2

Additional information

NPB9780815512882
9780815512882
0815512880
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications by John E.J. Schmitz (Philips Semiconductor former COO of SEMATECH)
New
Hardback
William Andrew Publishing
1992-12-31
251
N/A
Book picture is for illustrative purposes only, actual binding, cover or edition may vary.
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