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Rapid Thermal Processing of Semiconductors Victor E. Borisenko

Rapid Thermal Processing of Semiconductors By Victor E. Borisenko

Rapid Thermal Processing of Semiconductors by Victor E. Borisenko


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Summary

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions.

Rapid Thermal Processing of Semiconductors Summary

Rapid Thermal Processing of Semiconductors by Victor E. Borisenko

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Table of Contents

Transient Heating of Semiconductors by Radiation. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals. Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon. Component Evaporation, Defect Annealing and Impurity Diffusion in the III-V Semicondutors. Diffusion Synthesis of Silicides in Thin Film Metal-Silicon Structures. Rapid Thermal Oxidation and Nitridation. Rapid Thermal Chemical Vapor Deposition. Indexes.

Additional information

NPB9780306450549
9780306450549
0306450542
Rapid Thermal Processing of Semiconductors by Victor E. Borisenko
New
Hardback
Springer Science+Business Media
1997-05-31
358
N/A
Book picture is for illustrative purposes only, actual binding, cover or edition may vary.
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